
I. Fundamentum Solutionis
In applicationibus high-precision sicut rete intelligentia, mensura energiae renovabilis, et monitorium potentiae industrialis, transformatores currentis low-voltage (LV CTs) traditionales saepe videntur deficere in praecisione, drift significativus temperaturae, et stabilitate longaevae. Ad satisfaciendum requirementis mensurae 0.2S/0.5S-class high-precision, haec solutio proponit designum comprehensivum melioratum pro LV CTs electromagneticis per innovationem materialis nucleique et optimisationem structurae.
II. Core Technical Solutions
- Materiales Nuclei Permeabilitatis Altae Upgradati
• Nanocrystallina/Amorphous Alloy Ultra-Thin Strips:
Nuclei sunt contorti ex stipulis nanocrystallinis vel amorphous alloy crassitudine 0.02–0.025mm, attingentes permeabilitatem initialem (μi) supra 1.5×10⁵ H/m. Hoc significatim reducit currentem excitationis et minimizat errores ratio/phase.
• Optimisatio Domainorum Magneticorum:
Annealing campi magnetic directi eliminat stress nucleique, augeat uniformitatem fluxus, et minuat hysteresis losses sub harmonicis altae frequentiae.
- Structurae Shielding Magneticae et Anti-Interference
• Multi-Layer Composite Magnetic Shielding:
Layeres shielding dual Permalloy + reticulum cupri adduntur circa nucleus ad suppressam interventum externam AC campi magnetici et mitigare effectus DC bias.
• Processus Winding Orthogonalis:
Technologia winding orthogonalis segmentata pro windings secundariis reducit capacitance distributam et inductance leakage, augeat responsionem frequentiae (accurate deviatio < ±0.1% intra bandwidth 1–5kHz).
- Compensatio Temperaturae et Processus Signalis
• Circuitus Compensatio Dynamica Temperaturae:
Sensoribus NTC/PTC altae linearis integratis real-time compensantur drift temperature nucleique et resistance winding (temp. drift coefficient ≤ ±10 ppm/°C).
• Resistor Sampling Stabilitatis Altae:
Resistores metal foil low-drift (ΔR/R < ±5 ppm/°C) cum connectionibus Kelvin quattuor terminorum assecurant accuratiam conversionis currentis ad tensionem.
- Encapsulation et Reinforcement Insulationis
• Processus Potting Vacuum:
Potting epoxy resin purissimae ad 10⁻³ Pa eliminat bullas et stress internos, augeat fortitudinem mechanicam et stabilitatem thermalem.
• Architectura Insulationis Multi-Layer:
Film polyimide + composite silicone interlayer assequitur dielectric strength >15 kV/mm et partial discharge <5 pC (@1.5Ur).
III. Advantages Performance
|
Parameter
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Conventional CT
|
This Solution
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Improvement
|
|
Accuracy Class
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0.5–1.0
|
0.2S/0.5S
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Ratio/Phase errors ↓50%
|
|
Temp. Drift Coeff.
|
±100 ppm/°C
|
±10 ppm/°C
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10x better stability
|
|
Long-Term Stability
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±0.3%/year
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±0.05%/year
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Lifetime error controllable
|
|
Phase Error (1%In)
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>30'
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<5'
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Phase precision ↑6x
|
|
Operating Temp.
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-25°C~+70°C
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-40°C~+85°C
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Enhanced extreme-environment adaptability
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IV. Application Scenarios
Haec solutio est specialiter apta pro:
• Power Metering: Metra smart, systemata automationis distributionis (compliantia standard IEC 61869-2)
• Renewable Energy Monitoring: Sampling currentis high-precision in PV inverters et systemata storage energy
• Industrial Control: Detectio currentis fault in VFDs et dispositiva protectionis motorum
• Lab Standards: Serviens ut 0.2S-class standard transformers pro transferentia valoris